HOME  /  SEARCH  /  LOG IN  /  SIGN UP
Cover Gallery
Journals
2024 (11)
2023 (30)
2022 (24)
2021 (22)
2020 (38)
2019 (29)
2018 (33)
2017 (28)
2016 (27)
2015 (28)
2014 (21)
2013 (17)
2012 (18)
2011 (19)
2010 (17)
2009 (17)
2008 (19)
2007 (12)
2006 (20)
2005 (21)
1982 ~ 2004 (88)
Patents
Domestic
International
Books & Reviews
 
 Home > Publication > Journals > 2013 (17) > (2013-02) Decoupling the Bias-Stress-Induced Charge Trapping in Semiconductors and Gate-Dielectrics of Organic Transistors Using a Double Stretched-Exponential Formula

(2013-02) Decoupling the Bias-Stress-Induced Charge Trapping in Semiconductors and Gate-Dielectrics of Organic Transistors Using a Double Stretched-Exponential Formula
Hyun Ho Choi, Moon Sung Kang, Min Kim, Haena Kim, Jeong Ho Cho, Kilwon Cho, Adv. Funct. Mater. 2013, 23, 690 (view at publisher)

¸ñ·Ïº¸±â 

À̵¿:  


ÀÌ¿ë¾à°ü | °³ÀÎÁ¤º¸Ãë±Þ¹æħ | À̸ÞÀÏÁÖ¼Ò¹«´Ü¼öÁý°ÅºÎ | û¼Ò³âº¸È£Á¤Ã¥ | Ã¥ÀÓÀÇÇÑ°è¿Í¹ýÀû°íÁö | °Ë»ö°á°ú¼öÁý°ÅºÎ
Department of Chemical Engineering, POSTECH, 67, Cheongam-ro, Pohang, 37673, KOREA Tel : 054-279-2932 Fax : 054-279-8298
Copyright © 2008 CRG All rights reserved / Manager : myjeong46@postech.ac.kr  / Supported by ONTOIN