HOME  /  SEARCH  /  LOG IN  /  SIGN UP
Cover Gallery
Journals
2024 (11)
2023 (30)
2022 (24)
2021 (22)
2020 (38)
2019 (29)
2018 (33)
2017 (28)
2016 (27)
2015 (28)
2014 (21)
2013 (17)
2012 (18)
2011 (19)
2010 (17)
2009 (17)
2008 (19)
2007 (12)
2006 (20)
2005 (21)
1982 ~ 2004 (88)
Patents
Domestic
International
Books & Reviews
 
 Home > Publication > Cover Gallery > 21. Adv. Electon. Mater. 2016 (Inside front cover)

 21. Adv. Electon. Mater. 2016 (Inside front cover)

Molecular Orientation-dependent Bias Stress Stability in Bottom-Gate Organic Transistors based on an n-Type Semiconducting Polymer

Boseok Kang,† Byungho Moon,† Hyun Ho Choi,† Eunjoo Song, and Kilwon Cho, Adv. Electron. Mater. 2016, 1500380  (Inside Front Cover) (view at publisher)

Selected as Inside Front Cover (Click here to see the paper)

¸ñ·Ïº¸±â 
À̵¿:  


ÀÌ¿ë¾à°ü | °³ÀÎÁ¤º¸Ãë±Þ¹æħ | À̸ÞÀÏÁÖ¼Ò¹«´Ü¼öÁý°ÅºÎ | û¼Ò³âº¸È£Á¤Ã¥ | Ã¥ÀÓÀÇÇÑ°è¿Í¹ýÀû°íÁö | °Ë»ö°á°ú¼öÁý°ÅºÎ
Department of Chemical Engineering, POSTECH, 67, Cheongam-ro, Pohang, 37673, KOREA Tel : 054-279-2932 Fax : 054-279-8298
Copyright © 2008 CRG All rights reserved / Manager : myjeong46@postech.ac.kr  / Supported by ONTOIN