The bias stability of OFET devices remains a critical obstacle to their commercial use. The microstructural origins of charge traps inside OFET devices are not yet clearly understood. We investigated the correlation between the molecular orientations of the conjugated polymer thin films and the bias stress stabilities in OFETs fabricated using structurally controlled films by exploiting the unique electrical properties of P(NDI2OD-T2). A relatively high bias stress stability was observed in the P(NDI2OD-T2) FETs prepared with a face-on structure, compared to the FETs prepared with an edge-on film structure. The trapped charges induced by the bias stress were predominantly present in the P(NDI2OD-T2) layer, particularly near the interface with the source/drain electrodes. The measured trap DOS profiles indicated that the intensities of the energy states in the mid-gap region (1.15 and 1.25 eV) differed significantly, depending on the structure (edge-on or face-on) of the P(NDI2OD-T2) thin films. These results indicated the formation of localized polaron pairs, and aliphatic alkyl chains present in the edge-on structured P(NDI2OD-T2) film appeared to present a huddle to vertical charge transport, thereby increasing the density of the bipolarons during the bias stress. We believe that these results pave the way for the fabrication of practical and useful OFETs with a high degree of bias stress stability suitable for the realization of commercially available OFET-based products.
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Written by OTFT Team ( Seonbaek Lee, Sangsik Park, Jinsung Kim, Seonghyun Kim, Sanghyo Kim, Minkyu Kim )
Edited by Kwangwoo Cho ( 2019.11.05 )